Theory and application of laser chemical vapor deposition /

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemi...

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Bibliographic Details
Main Author: Mazumder, J.
Corporate Author: SpringerLink (Online service)
Other Authors: Kar, Aravinda
Format: eBook
Language:English
Published: New York : Plenum Press, [1995]
Series:Lasers, photonics, and electro-optics.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Physical Description:1 online resource (xii, 395 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:9781489914309 (electronic bk.)
1489914307 (electronic bk.)