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Ultraclean Surface Processing of Silicon Wafers : Secrets of VLSI Manufacturing /

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The contamination of wafer surfaces with particles arising from the processing equipment is the main reason for yield losses in the manufacturing of VLSI devices. The starting point for the control of contamination must be the surface of the wafer itself and not just the reduction of contamination i...

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Bibliographic Details
Main Author: Hattori, Takeshi, 1909-1991
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Berlin, Heidelberg : Springer Berlin Heidelberg, 1998.
Subjects:
Electronics.
Optical materials.
Surfaces (Physics)
Electronic books.
Online Access:Connect to the full text of this electronic book

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