APA (7th ed.) Citation

Borst, C. L., Gill, W. N., & Gutmann, R. J. (2002). Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses: Fundamental mechanisms and application to IC interconnect technology. Kluwer Academic Publishers.

Chicago Style (17th ed.) Citation

Borst, Christopher L., William N. Gill, and Ronald J. Gutmann. Chemical-mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology. Boston: Kluwer Academic Publishers, 2002.

MLA (9th ed.) Citation

Borst, Christopher L., et al. Chemical-mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms and Application to IC Interconnect Technology. Kluwer Academic Publishers, 2002.