Plasma processing of semiconductors /

Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage rang...

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Bibliographic Details
Corporate Authors: NATO Advanced Study Institute on Plasma Processing of Semiconductors Bonas, France, SpringerLink (Online service), North Atlantic Treaty Organization. Scientific Affairs Division
Other Authors: Williams, P. F. (P. Frazer)
Format: Conference Proceeding eBook
Language:English
Published: Dordrecht ; Boston : Kluwer Academic Publishers, [1997]
Series:NATO ASI series. Applied sciences ; no. 336.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Item Description:"Proceedings of the NATO Advanced Study Institute on Plasma Processing of Semiconductors, Château de Bonas, France, 17-18-June, 1996"--title page verso.
"Published in cooperation with the NATO Scientific Affairs Division."
Physical Description:1 online resource (x, 613 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:9789401158848 (electronic bk.)
9401158843 (electronic bk.)