Modeling of chemical vapor deposition of tungsten films /
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| Corporate Author: | |
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| Format: | eBook |
| Language: | English |
| Published: |
Basel ; Boston :
Birkhäuser Verlag,
1993.
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| Series: | Progress in numerical simulation for microelectronics ;
vol. 2. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Item Description: | Electronic resource. |
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| Physical Description: | 1 online resource (138 pages) : illustrations. |
| Format: | Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |
| Bibliography: | Includes bibliographical references. |
| ISBN: | 9783034877411 (electronic bk.) 3034877412 (electronic bk.) |