Industrial ion sources : broadbeam gridless ion source technology /

Bibliographic Details
Main Author: Zhurin, Viacheslav V.
Format: eBook
Language:English
Published: Weinheim : Wiley-VCH, [2012]
Series:Wiley Online Library.
Subjects:
Online Access:Connect to the full text of this electronic book

MARC

Tag First Indicator Second Indicator Subfields
LEADER 00000cam a2200000Ka 4500
001 in00002768621
005 20210728124922.0
006 m d
007 cr cn|||||||||
008 120119s2012 gw a ob 001 0 eng d
019 |a 793494055 
020 |a 3527635726 (electronic bk.) 
020 |a 3527635734 (ePub) 
020 |a 3527635742 (ePDF) 
020 |a 3527635750 (mobi) 
020 |a 9783527635726 (electronic bk.) 
020 |a 9783527635733 (ePub) 
020 |a 9783527635740 (ePDF) 
020 |a 9783527635757 (mobi) 
020 |z 9783527410293 (print) 
035 |a (OCoLC)773301847  |z (OCoLC)793494055 
035 |a (OCoLC)ocn773301847 
035 |a 4011568 
037 |a 10.1002/9783527635726  |b Wiley InterScience  |n http://www3.interscience.wiley.com 
040 |a DG1  |b eng  |c DG1  |d B24X7  |d TXA  |d UtOrBLW 
049 |a TXAM 
050 4 |a QC702.3  |b .Z48 2012eb 
082 0 4 |a 541.372  |2 23 
100 1 |a Zhurin, Viacheslav V.  |0 http://id.loc.gov/authorities/names/nb2011032062 
245 1 0 |a Industrial ion sources :  |b broadbeam gridless ion source technology /  |c Viacheslav V. Zhurin. 
264 1 |a Weinheim :  |b Wiley-VCH,  |c [2012] 
264 4 |c ©2012 
300 |a 1 online resource (xiii, 312 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
500 |a Electronic resource. 
504 |a Includes bibliographical references and index. 
505 0 |a Front Matter -- Hall-Current Ion Sources -- Ion Source and Vacuum Chamber. Influence of Various Effects on Ion Beam Parameters -- Oscillations and Instabilities in Hall-Current Ion Sources -- Optimum Operation of Hall-Current Ion Sources -- Cathode Neutralizers for Ion Sources -- Industrial Gridless Broad-Beam Ion Source Producers, Problems and the Need for Their Standardization -- Operation of Industrial Ion Sources with Reactive Gases -- Ion Beam and Radiation Impact on Substrate Heating -- Ion Beam Energy and Current -- Plasma Optical Systems -- Ion and Plasma Sources for Science and Technology -- Ion Assist, and its Different Applications -- Magnetron with Non-Equipotential Cathode -- Index. 
588 |a Description based on print version record. 
650 0 |a Ion sources.  |0 http://id.loc.gov/authorities/subjects/sh85067808 
655 7 |a Electronic books.  |2 local 
776 0 8 |i Print version:  |a Zhurin, Viacheslav V.  |t Industrial ion sources.  |d Weinheim : Wiley-VCH ;, c2012  |z 9783527410293  |w (OCoLC)767863944 
830 0 |a Wiley Online Library. 
856 4 0 |u http://proxy.library.tamu.edu/login?url=https://dx.doi.org/10.1002/9783527635726  |z Connect to the full text of this electronic book  |t 0 
948 |a cataloged  |b h  |c 2012/8/16  |d c  |e jlanham  |f 3:29:07 pm 
994 |a C0  |b TXA 
999 |a MARS 
999 f f |s 18a0b67a-655b-3ff2-a71a-e7a217452b68  |i 7af2b988-279c-38bf-996b-f88308e35794  |t 0 
952 f f |a Texas A&M University  |b College Station  |c Electronic Resources  |d Available Online  |t 0  |e QC702.3 .Z48 2012eb  |h Library of Congress classification 
998 f f |a QC702.3 .Z48 2012eb  |t 0  |l Available Online