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Extreme ultraviolet lithography /

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Bibliographic Details
Other Authors: Wu, Banqiu, Kumar, Ajay, 1962-
Format: Book
Language:English
Published: New York : McGraw-Hill, [2009]
Subjects:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Description
Physical Description:xiv, 465 pages : illustrations ; 24 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780071549189 (alk. paper)
0071549188 (alk. paper)