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Use of very-high-frequency plasmas to prepare a-Si:H-based triple-junction solar cells at high deposition rates : annual technical status report, 11 March 1998-11 March 1999 /

Bibliographic Details
Corporate Author: National Renewable Energy Laboratory (U.S.)
Other Authors: Jones, S. J.
Format: Government Document Book
Language:English
Published: Golden, Colo. : National Renewable Energy Laboratory, [1999]
Series:NREL/SR ; 520-26795.
Subjects:
Photovoltaic cells > Research.
Solar cells.
Thin films.
Plasma-enhanced chemical vapor deposition.
Online Access:https://purl.fdlp.gov/GPO/LPS95673
Description
Item Description:Title from title screen (viewed June 20, 2008).
"September 1999."
"Subcontractor report."
Electronic resource.
Physical Description:29 pages : digital, PDF file.
Format:Mode of access: Internet from the NREL web site. Address as of 6/20/08: http://www.nrel.gov/docs/fy99osti/26795.pdf ; current access available via PURL.