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Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : symposium held April 10-12, 2007, San Francisco, California, U.S.A. /

Bibliographic Details
Corporate Authors: Symposium B, "Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics" San Francisco, Calif., Materials Research Society. Fall Meeting
Other Authors: Lin, Qinghuang, 1963-
Format: Conference Proceeding Book
Language:English
Published: Warrendale, Penn. : Materials Research Society, [2007]
Series:Materials Research Society symposia proceedings ; v. 990.
Subjects:
Interconnects (Integrated circuit technology) > Congresses.
Integrated circuits > Very large scale integration > Congresses.
Microelectronics > Congresses.
Nanoelectronics > Congresses.
Materials > Congresses.
Description
Item Description:"Symposium B, 'Materials, Processes, Integration and Reliability in Advanced Inteconnects for Micro- and Nanoelectronics,' the MRS 'interconnect symposium'," [was] held April 10-12 at the 2007 MRS Spring Meeting in San Francisco, California"--Pref."
Physical Description:xiv, 338 pages : illustrations ; 24 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:9781558999503
1558999507
ISSN:1067-9995 ;