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Photomask technology 2007 : 18-21 September 2007, Monterey, California, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Naber, Robert J., Kawahira, Hiroichi
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2007]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6730.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Some earlier conferences have title: Symposium on Photomask Technology.
Physical Description:3 volumes (various pagings) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819468871 (3 vol. set)
0819468878 (3 vol. set)