Symposium on Photomask Technology Monterey, Calif, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Naber, R. J., & Kawahira, H. (2007). Photomask technology 2007: 18-21 September 2007, Monterey, California, USA. SPIE.
Chicago Style (17th ed.) CitationSymposium on Photomask Technology Monterey, Calif, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers, Robert J. Naber, and Hiroichi Kawahira. Photomask Technology 2007: 18-21 September 2007, Monterey, California, USA. Bellingham, Washington: SPIE, 2007.
MLA (9th ed.) CitationSymposium on Photomask Technology Monterey, Calif, et al. Photomask Technology 2007: 18-21 September 2007, Monterey, California, USA. SPIE, 2007.
Warning: These citations may not always be 100% accurate.