http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
Photomask and next-generation lithography mask technology XIV
Photomask and next-generation lithography mask technology fourteen
Photomask and next-generation lithography mask technology 14
Society of Photo-optical Instrumentation Engineers
2 volumes (various pagings) : illustrations ; 28 cm.
Hidehiro Watanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Some earlier proceedings have title: Photomask and X-ray mask technology.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 6607