Cover Image

Metrology, inspection, and process control for microlithography XXI : 26 February-1 March 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Archie, Chas N.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2007]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6518.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Description
Physical Description:3 volumes (various pagings) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819466372
0819466379