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Mechanisms of growth of nanocrystalline silicon deposited by hot-wire chemical vapor deposition /

Bibliographic Details
Corporate Author: National Renewable Energy Laboratory (U.S.)
Other Authors: Moutinho, Helio R.
Format: Government Document eBook
Language:English
Published: Golden, Colo. : National Renewable Energy Laboratory, [2005]
Series:Conference paper (National Renewable Energy Laboratory (U.S.)) ; NREL/CP-520-37345.
Subjects:
Thin films.
Chemical vapor deposition.
Online Access:https://purl.fdlp.gov/GPO/LPS69116
Description
Item Description:"Prepared for the 31st IEEE Photovoltaics Specialists Conference and Exhibition, Lake Buena Vista, Florida, January 3-7, 2005."
Title from title screen (viewed on Apr. 20, 2006).
"February 2005."
Electronic resource.
Physical Description:1 online resource (4 pages) : illustrations
Format:Mode of access: Internet from the NREL web site. Address as of 4/20/06: http://www.nrel.gov/docs/fy05osti/37345.pdf ; current access available via PURL.
Bibliography:Includes bibliographical references.