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EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany /

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Bibliographic Details
Corporate Authors: European Conference on Mask Technology for Integrated Circuits and Microcomponents Dresden, Germany, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Behringer, Uwe F. W.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6281.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
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