Advances in resist technology and processing XXIII : 20-22 February 2006, San Jose, California, USA /
| Corporate Authors: | , |
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| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Washington :
SPIE,
[2006]
|
| Series: | Proceedings of SPIE--the International Society for Optical Engineering ;
v. 6153. |
| Subjects: |
| Physical Description: | 2 volumes (various pagings) : illustrations ; 28 cm. |
|---|---|
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0819461962 |