Cover Image

Emerging lithographic technologies X : 21-23 February 2006, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMITECH, Inc
Other Authors: Lercel, Michael J. (Michael James), 1969-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6151.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:2 volumes (various pagings) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819461946