http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
Metrology, inspection, and process control for microlithography XIX
28 February-3 March 2005, San Jose, California, USA
Metrology, inspection and process control for microlithography nineteen
Metrology, inspection and process control for microlithography 19
Society of Photo-optical Instrumentation Engineers
3 volumes (xlv, 1474 pages) : illustrations ; 28 cm.
Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 5752