rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Metrology, inspection, and process control for microlithography XIX
    sub title: 28 February-3 March 2005, San Jose, California, USA
  title info:
    title: Metrology, inspection and process control for microlithography nineteen
  title info:
    title: Metrology, inspection and process control for microlithography 19
  name:
    name part: Silver, Richard M.
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  name:
    name part: International SEMATECH
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 2005
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: 3 volumes (xlv, 1474 pages) : illustrations ; 28 cm.
  note: Richard M. Silver, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, International SEMATECH.
  note: Includes bibliographical references and index.
  subject:
    topic: Integrated circuits
    topic: Inspection
    genre: Congresses
  subject:
    topic: Integrated circuits
    topic: Measurement
    genre: Congresses
  subject:
    topic: Microlithography
    genre: Congresses
  subject:
    topic: Process control
    genre: Congresses
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 5752
  identifier: 0819457329
  record info:
    record content source: LHL
    record creation date: 050610
    record change date: 20151102050907.0
    record identifier: in00002060245