Spatial stochastic processes for yield and reliability management with applications to nano electronics /
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| Format: | Thesis eBook |
| Language: | English |
| Published: |
[College Station, Tex.] :
[Texas A&M University],
[2005]
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| Online Access: | Link to OAK Trust copy |
| Abstract: | This study uses the spatial features of defects on the wafers to examine the detection and control of process variation in semiconductor fabrication. It applies spatial stochastic process to semiconductor yield modeling and the extrinsic reliabil-ity estimation model. New yield models of integrated circuits based on the spatial point process are established. The defect density which varies according to location on the wafer is modeled by the spatial nonhomogeneous Poisson process. And, in order to capture the variations in defect patterns between wafers, a random coeffcient model and model-based clustering are applied. Model-based clustering is also applied to the fabrication process control for detecting these defect clusters that aregenerated by assignable causes. An extrinsic reliability model using defect data and a statistical defect growth model are developed based on the new yield model. |
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| Item Description: | "Major Subject: Industrial Engineering" Title from author supplied metadata (automated record created on Feb. 17, 2005.) Vita. Abstract. Electronic resource. |
| Format: | Mode of access: World Wide Web. System requirements: World Wide Web access and Adobe Acrobat Reader. |
| Bibliography: | Includes bibliographical references. |