Resistivity changes in carbon-implanted Teflon /

The change in resistance of Teflon due to the implantation of carbon atoms was measured. The procedure involved implanting carbon at energies of 40 kV, 50 kV, and 140 kV using beam currents ranging from 0.5 [mu]A to 3 [mu]A for time intervals ranging from 30 minutes to over an hour. Silver paste w...

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Bibliographic Details
Main Author: Jackson, Matthew R., 1983-
Format: Thesis Book
Language:English
Published: [Place of publication not identified] : [publisher not identified] ; 2004.
Subjects:
Online Access:Link to OAK Trust copy

MARC

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245 1 0 |a Resistivity changes in carbon-implanted Teflon /  |c by Matthew R. Jackson. 
264 1 |a [Place of publication not identified] :  |b [publisher not identified] ;  |c 2004. 
300 |a vii, 27 leaves :  |b illustrations ;  |c 28 cm. 
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504 |a Includes bibliographical references (leaf 23). 
500 |a Vita. 
500 |a "Major Subject: Nuclear Engineering". 
520 |a The change in resistance of Teflon due to the implantation of carbon atoms was measured. The procedure involved implanting carbon at energies of 40 kV, 50 kV, and 140 kV using beam currents ranging from 0.5 [mu]A to 3 [mu]A for time intervals ranging from 30 minutes to over an hour. Silver paste was used to attach leads to the implanted Teflon samples, and a Fluke multimeter utilized to measure the voltage across a 10 M[Omega] resistor placed in series with the Teflon-implanted resistor. Significant deviations from Teflon's native resistance were observed and exhibited exponential decreases in resistance with increasing voltage. 
650 4 |a Major nuclear engineering. 
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