Nominanda, H. (2004). Study of plasma enhanced chemical vapor deposition of boron-doped hydrogenated amorphous silicon thin films and the application to p-channel thin film transistor. [publisher not identified].
Chicago Style (17th ed.) CitationNominanda, Helinda. Study of Plasma Enhanced Chemical Vapor Deposition of Boron-doped Hydrogenated Amorphous Silicon Thin Films and the Application to P-channel Thin Film Transistor. [Place of publication not identified]: [publisher not identified], 2004.
MLA (9th ed.) CitationNominanda, Helinda. Study of Plasma Enhanced Chemical Vapor Deposition of Boron-doped Hydrogenated Amorphous Silicon Thin Films and the Application to P-channel Thin Film Transistor. [publisher not identified], 2004.
Warning: These citations may not always be 100% accurate.