rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Photomask and next-generation lithography mask technology XI
    sub title: 14-16 April 2004, Yokohama, Japan
  title info:
    title: Photomask and next-generation lithography mask technology eleven
  title info:
    title: Photomask and next-generation lithography mask technology 11
  name:
    name part: Tanabe, Hiroyoshi.
  name:
    name part: Photomask Japan
  name:
    name part: BACUS (Technical group)
  name:
    name part: Institute of Electrical Engineers of Japan. Japan section
  name:
    name part: Semiconductor Equipment and Materials International (Japan)
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 2004
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: 2 volumes (xxxiii, 990 pages) : illustrations ; 28 cm.
  note: Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--the International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan . . . (et al.); co-organized by Yokohama City (Japan) ; published by SPIE--the International Society for Optical Engineering.
  note: Some earlier proceedings have title: Photomask and X-ray mask technology.
  note: Includes bibliographical references and index.
  subject:
    topic: Masks (Electronics)
    genre: Congresses
  subject:
    topic: Integrated circuits
    topic: Masks
    genre: Congresses
  subject:
    topic: X-ray lithography
    genre: Congresses
  subject:
    topic: Microlithography
    genre: Congresses
  subject:
    topic: Optoelectronic devices
    topic: Design and construction
    genre: Congresses
  classification: TK7878 .P46 2004
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446
  identifier: 0819453692
  record info:
    record content source: LHL
    record creation date: 040907
    record change date: 20151031121855.0
    record identifier: in00001996984