Cover Image

Photomask and next-generation lithography mask technology XI : 14-16 April 2004, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Institute of Electrical Engineers of Japan. Japan section, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers
Other Authors: Tanabe, Hiroyoshi
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.
Description
Item Description:Some earlier proceedings have title: Photomask and X-ray mask technology.
Physical Description:2 volumes (xxxiii, 990 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819453692