APA (7th ed.) Citation

Photomask Japan, BACUS (Technical group), Institute of Electrical Engineers of Japan. Japan section, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers, & Tanabe, H. (2004). Photomask and next-generation lithography mask technology XI: 14-16 April 2004, Yokohama, Japan. SPIE.

Chicago Style (17th ed.) Citation

Photomask Japan, BACUS (Technical group), Institute of Electrical Engineers of Japan. Japan section, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers, and Hiroyoshi Tanabe. Photomask and Next-generation Lithography Mask Technology XI: 14-16 April 2004, Yokohama, Japan. Bellingham, Washington: SPIE, 2004.

MLA (9th ed.) Citation

Photomask Japan, et al. Photomask and Next-generation Lithography Mask Technology XI: 14-16 April 2004, Yokohama, Japan. SPIE, 2004.