Cover Image

Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Smith, Bruce W., 1959-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5377.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Description
Physical Description:3 volumes (xxiii, 2008 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819452904 (set)