APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Smith, B. W. (2004). Optical microlithography XVII: 24-27 February 2004, Santa Clara, California, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Bruce W. Smith. Optical Microlithography XVII: 24-27 February 2004, Santa Clara, California, USA. Bellingham, Washington: SPIE, 2004.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Optical Microlithography XVII: 24-27 February 2004, Santa Clara, California, USA. SPIE, 2004.