APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Silver, R. M. (2004). Metrology, inspection, and process control for microlithography XVIII: 23-26 February 2004, Santa Clara, California, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Richard M. Silver. Metrology, Inspection, and Process Control for Microlithography XVIII: 23-26 February 2004, Santa Clara, California, USA. Bellingham, Washington: SPIE, 2004.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Metrology, Inspection, and Process Control for Microlithography XVIII: 23-26 February 2004, Santa Clara, California, USA. SPIE, 2004.