Cover Image

Advances in resist technology and processing XXI : 23-24 February 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Sturtevant, John L.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5376.
Subjects:
Photoresists > Congresses.
Microlithography > Congresses.
Description
Physical Description:2 volumes (xxxviii, 1288 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819452890