Cover Image

Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Mackay, R. Scott
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5374.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:2 volumes (xxxviii, 1110 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819452874