Looking both ways : art of the contemporary African diaspora /

Bibliographic Details
Corporate Author:	Museum for African Art (New York, N.Y.)
Other Authors:	Farrell, Laurie Ann, Byvanck, Valentijn
Format:	Book
Language:	English
Published:	New York : Gent : Museum for African Art ; Snoeck, [2003]
Subjects:	Art, African > 20th century > Exhibitions. Art, African > 21st century > Exhibitions. Expatriate artists > Foreign countries > Exhibitions. Artists > Africa > Exhibitions. Artists > Africa > Psychology.

Description
Item Description:	Published in conjunction with an exhibition organized by and held at Museum for African Art, New York, Nov. 14, 2003-Mar. 1, 2004 and traveling to other venues.
Physical Description:	184 pages : illustrations (some color) ; 31 cm.
Bibliography:	Includes bibliographical references (page 182).
ISBN:	0945802358 905349443X