Cover Image

Design and process integration for microelectronic manufacturing II : 26-27 February 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Liebmann, Lars W.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5379.
Subjects:
Integrated circuits > Design and construction > Congresses.
Integrated circuits > Defects > Analysis > Congresses.
Semiconductors > Design and construction > Congresses.
Semiconductor wafers > Defects > Analysis > Congresses.
Microelectronics industry > Quality control > Congresses.
Quality control > Congresses.
Description
Item Description:2004 conference is the third conference in the series.
Physical Description:xxviii, 302 pages : illustrations, portraits ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819452920