rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Federal statutory protection for mask works
  name:
    name part: Library of Congress
    name part: Copyright Office.
  type of resource: text
  origin info:
    place:
      place term: dcu
    date issued: 19uu
    date issued: 9999
    issuance: continuing
  language:
    language term: eng
  physical description:
    form: print
    extent: volumes ; 28 cm.
  note: Description based on: November 1994; title from cover.
  note: Current issue also available via Internet at the Copyright Office web site. Address as of 2/24/04: http://www.copyright.gov/circs/circ100.pdf; current access available via PURL.
  subject:
    topic: Copyright
    geographic: United States
    genre: Periodicals
  subject:
    topic: Design protection
    geographic: United States
    genre: Periodicals
  subject:
    topic: Semiconductors
    genre: Periodicals
  classification: LC 3.4/2:100/
  related item:
    title info:
      title: Circular (Library of Congress. Copyright Office) ; 100
  identifier: 2004230283
  identifier: https://purl.fdlp.gov/GPO/LPS44318
  record info:
    record content source: FDS
    record creation date: 951020
    record change date: 20211202184620.0
    record identifier: in00001828101