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23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Kimmel, Kurt Rudolf, Staud, Wolfgang
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2003]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5256.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Some earlier conferences have title: Symposium on Photomask Technology and Management.
Physical Description:2 volumes (xix, 1362 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819451436