| Tag |
First Indicator |
Second Indicator |
Subfields |
| LEADER |
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| 001 |
in00001712708 |
| 005 |
20151024185055.0 |
| 008 |
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| 010 |
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|a 2002070662
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| 020 |
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|a 0444510958
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|a (OCoLC)ocm49844130
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| 040 |
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|a DLC
|c DLC
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|d TXA
|d UtOrBLW
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| 042 |
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|a pcc
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| 049 |
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|a TXAM
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| 050 |
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|a TA2020
|b .A63 2002
|
| 082 |
0 |
0 |
|a 621.044
|2 21
|
| 245 |
0 |
0 |
|a Advances in low temperature rf plasmas :
|b basis for process design /
|c edited by T. Makabe.
|
| 250 |
|
|
|a 1st ed.
|
| 264 |
|
1 |
|a Amsterdam ;
|a Boston :
|b North Holland/Elsevier,
|c 2002.
|
| 300 |
|
|
|a xii, 341 pages :
|b illustrations ;
|c 27 cm.
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a unmediated
|b n
|2 rdamedia
|
| 338 |
|
|
|a volume
|b nc
|2 rdacarrier
|
| 504 |
|
|
|a Includes bibliographical references and indexes.
|
| 650 |
|
0 |
|a Low temperature plasmas
|x Industrial applications.
|
| 700 |
1 |
|
|a Makabe, T.
|q (Toshiaki)
|
| 948 |
|
|
|a cataloged
|b h
|c 2002/12/17
|d c
|e ceaton
|f 12:47:20 pm
|
| 994 |
|
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|a E0
|b TXA
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|t 0
|
| 952 |
f |
f |
|p normal
|a Texas A&M University
|b College Station
|c Sterling C. Evans Library
|d Evans: Library Stacks
|t 0
|e TA2020 .A63 2002
|h Library of Congress classification
|i unmediated -- volume
|m A14829581169
|
| 998 |
f |
f |
|a TA2020 .A63 2002
|t 0
|l Evans: Library Stacks
|