Cover Image

Advances in low temperature rf plasmas : basis for process design /

Bibliographic Details
Other Authors: Makabe, T. (Toshiaki)
Format: Book
Language:English
Published: Amsterdam ; Boston : North Holland/Elsevier, 2002.
Edition:1st ed.
Subjects:
Low temperature plasmas > Industrial applications.
Description
Physical Description:xii, 341 pages : illustrations ; 27 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:0444510958