Cover Image

Metrology, inspection, and process control for microlithography XVI : 26 4-7 March 2002, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Herr, Daniel J. C.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2002]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4689.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Description
Physical Description:2 volumes (xl, 1204 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819444359