APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, & Herr, D. J. C. (2002). Metrology, inspection, and process control for microlithography XVI: 26 4-7 March 2002, Santa Clara, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH, and Daniel J. C. Herr. Metrology, Inspection, and Process Control for Microlithography XVI: 26 4-7 March 2002, Santa Clara, USA. Bellingham, Washington: SPIE, 2002.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Metrology, Inspection, and Process Control for Microlithography XVI: 26 4-7 March 2002, Santa Clara, USA. SPIE, 2002.