http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
Advances in resist technology and processing XIX
Advances in resist technology and processing nineteen
Advances in resist technology and processing 19
Society of Photo-optical Instrumentation Engineers
Semiconductor Equipment and Materials International
2 volumes (xlii, 1234 pages) : illustrations ; 28 cm.
Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690