rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Advances in resist technology and processing XIX
    sub title: 4-6 March 2002, Santa Clara, USA
  title info:
    title: Advances in resist technology and processing nineteen
  title info:
    title: Advances in resist technology and processing 19
  name:
    name part: Fedynyshyn, Theodore H.
    name part: 1952-
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  name:
    name part: Semiconductor Equipment and Materials International
  name:
    name part: International SEMATECH
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 2002
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: 2 volumes (xlii, 1234 pages) : illustrations ; 28 cm.
  note: Theodore H. Fedynyshyn, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
  note: Includes bibliographical references and index.
  subject:
    topic: Photoresists
    genre: Congresses
  subject:
    topic: Microlithography
    genre: Congresses
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 4690
  identifier: 0819444367
  record info:
    record content source: LHL
    record creation date: 020906
    record change date: 20151024152310.0
    record identifier: in00001705055