Cover Image

Optical microlithography XV : 5-8 March 2002, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors: Yen, Anthony
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2002]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4691.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Description
Physical Description:2 volumes (xliv, 1778 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819444375