rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: 21st Annual BACUS Symposium on Photomask Technology
    sub title: 3-5 October, 2001 Monterey, USA
  title info:
    title: BACUS Symposium on Photomask Technology
  title info:
    title: Symposium on Photomask Technology and Management
  title info:
    title: Photomask technology
  name:
    name part: Symposium on Photomask Technology 2001 : Monterey, California)
    role:
      role term: creator
  name:
    name part: Dao, Giang T.
  name:
    name part: Grenon, Brian J.
  name:
    name part: BACUS (Technical group)
  name:
    name part: Society of Photo-optical Instrumentation Engineers
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: wau
    date issued: 2002
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: 2 volumes (xvi, 1178 pages) : illustrations ; 28 cm.
  note: Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
  note: Eighteenth conference entitled: Symposium on Photomask Technology and Management.
  note: Includes bibliographical references and index.
  subject:
    topic: Integrated circuits
    topic: Masks
    genre: Congresses
  subject:
    topic: Microlithography
    genre: Congresses
  related item:
    title info:
      title: Proceedings of SPIE--the International Society for Optical Engineering ; v. 4562
  identifier: 0819442909
  record info:
    record content source: LHL
    record creation date: 020408
    record change date: 20151024130341.0
    record identifier: in00001676341