http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
21st Annual BACUS Symposium on Photomask Technology
Symposium on Photomask Technology and Management
Symposium on Photomask Technology 2001 : Monterey, California)
Society of Photo-optical Instrumentation Engineers
2 volumes (xvi, 1178 pages) : illustrations ; 28 cm.
Giang T. Dao, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology, SPIE--the International Sociey for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.
Eighteenth conference entitled: Symposium on Photomask Technology and Management.
Includes bibliographical references and index.
Proceedings of SPIE--the International Society for Optical Engineering ; v. 4562