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21st Annual BACUS Symposium on Photomask Technology : 3-5 October, 2001 Monterey, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, California, BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Dao, Giang T., Grenon, Brian J.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2002]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4562.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Eighteenth conference entitled: Symposium on Photomask Technology and Management.
Physical Description:2 volumes (xvi, 1178 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819442909