Cover Image

Metrology, inspection, and process control for microlithography XV : 26 February-1 March 2001, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Sullivan, Neal T.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4344.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Description
Physical Description:xxv, 876 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819440302