Cover Image

Emerging lithographic technologies V : 27 February-1 March 2001, Santa Clara, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Dobisz, Elizabeth A. (Elizabeth Ann)
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2001]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 4343.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:xv, 818 pages : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819440299