rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Plasma processing XIII
    sub title: proceedings of the International Symposium
  name:
    name part: Symposium on Plasma Processing 2000 : Toronto, Canada)
    role:
      role term: creator
  name:
    name part: Mathad, G. S.
  name:
    name part: Electrochemical Society
    name part: Dielectric Science and Technology Division.
  name:
    name part: Electrochemical Society
    name part: Electronics Division.
  name:
    name part: Electrochemical Society
    name part: Meeting
    name part: (197 th : 2000 : Toronto, Canada)
  name:
    name part: International Symposium on Plasma Processing 2000 : Toronto, Canada)
  type of resource: text
  genre: bibliography
  genre: conference publication
  origin info:
    place:
      place term: nju
    date issued: 2000
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: ix, 394 pages : illustrations ; 23 cm.
  note: editor G.S. Mathad ; assistant editors, G.K. Celler [and others].
  note: "Dielectric Science and Technology and Electronics Divisions."
  note: "This proceedings volume contains the papers presented at the thirteenth symposium on Plasma Processing ... held as part of the 197th meeting of the Electrochemical Society, Inc. in Toronto, Canada, May 14-19, 2000."--Preface.
  note: Includes bibliographical references and indexes.
  subject:
    topic: Semiconductors
    topic: Etching
    genre: Congresses
  subject:
    topic: Plasma etching
    genre: Congresses
  related item:
    title info:
      title: Proceedings (Electrochemical Society) ; 2000-6
  identifier: 1566772710
  identifier: 00109733
  record info:
    record content source: I4Q
    record creation date: 010328
    record change date: 20151023053105.0
    record identifier: in00001613965