Cover Image

Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors: Vladimirsky, Yuli
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3676.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:2 volumes (xvii, 864 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819431508