Plasma processes for semiconductor fabrication /

Plasma processing XIII : proceedings of the International Symposium /
Published: (2000)

Applications of plasma processes to VLSI technology /
Published: (1985)

Dry etching technology for semiconductors /
by: Nojiri, Kazuo
Published: (2015)

Atomic layer processing : semiconductor dry etching technology /
by: Lill, Thorsten
Published: (2021)

In-situ patterning : selective area deposition and etching : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. /
Published: (1990)

Dry etching for microelectronics /
Published: (1984)

Materials modification by energetic atoms and ions : Symposium held April 28-30, 1992, San Francisco, California, USA /
Published: (1992)

Dry etching for VLSI /
by: Roosmalen, A. J. van
Published: (1991)

Optical lithography for advanced semiconductor patterning /
by: De Bisschop, Peter
Published: (2025)

Plasma processing of semiconductors /
Published: (1997)

Plasma etching : an introduction /
Published: (1989)

Selective and non-selective reactive ion etching of gallium arsenide and aluminum gallium arsenide /
by: Yost, Dennis J.
Published: (1989)

Plasma etching processes for CMOS device realization /
Published: (2017)

Lithography process control /
by: Levinson, Harry J.
Published: (1999)

Dry etching for VLSI /
by: Roosmalen, A. J. van
Published: (1991)

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
Published: (1990)

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
Published: (1990)

Plasma deposition, treatment, and etching of polymers /
Published: (1990)

Handbook of advanced plasma processing techniques /
Published: (2000)

Principles of plasma discharges and materials processing /
by: Lieberman, M. A. (Michael A.)
Published: (1994)

Introduction to microlithography : theory, materials, and processing : based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983 /
Published: (1983)

Etching characteristics and surface analysis of molecular bean epitaxy grown P-type aluminum gallium nitride with boron trichloride/chlorine gases in inductively coupled plasma (ICP) dry etching /
by: Semendy, Fred
Published: (2004)

Process and reliability assessment of plasma-based copper etch process /
by: Liu, Guojun
Published: (2010)

Principles of plasma discharges and materials processing /
by: Lieberman, M. A. (Michael A.)
Published: (2005)

Reliability of Plasma Etched Interconnect Lines and Applications in Solid State Electronic and Optoelectronic Devices /
by: Su, Jia Quan
Published: (2023)

A study on reactive ion etching of barium strontium titanate films using mixtures of argon (Ar), carbon tetrafluoride (CF4), and sulfur hexafluoride (SF6) /
by: Hirsch, Samuel G.
Published: (2014)

Plasma synthesis and etching of electronic materials : symposium held November 27-30, 1984, Boston, Massachusetts, U.S.A. /
Published: (1985)

Proceedings of the Symposium on Etching for Pattern Definition /
Published: (1976)

Silicon micromachining /
by: Elwenspoek, M. (Miko), 1948-
Published: (1998)

Etching in microsystem technology /
by: Köhler, J. M. (J. Michael), 1956-
Published: (1999)

Ätzverfahren für die Mikrotechnik /
by: Köhler, J. M. (J. Michael), 1956-
Published: (1998)

Silicon Run Etch :
Published: (2015)

Lithography process control /
by: Levinson, Harry J.
Published: (1999)

Making an etching /
by: West, Levon, 1900-1968
Published: (1932)

Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A. /
Published: (1991)

Laser/optical processing of electronic materials, 10-11 October 1989, Santa Clara, California /
Published: (1990)