rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Plasma processes for semiconductor fabrication
  name:
    name part: Hitchon, W. Nicholas G.
    role:
      role term: creator
  type of resource: text
  genre: bibliography
  origin info:
    place:
      place term: enk
    date issued: 1999
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: ix, 221 pages : illustrations ; 26 cm.
  note: W.N.G. Hitchon.
  note: Includes bibliographical references (pages 205-211) and index.
  subject:
    topic: Semiconductors
    topic: Etching
  subject:
    topic: Plasma etching
  subject:
    topic: Plasma etching
  subject:
    topic: Semiconductors
    topic: Etching
  classification: TK7871.85 .H54 1999
  classification: 621.3815/2
  related item:
    title info:
      title: Cambridge studies in semiconductor physics and microelectronic engineering ; 8
  identifier: 0521591759 (hardback)
  identifier: 98011717
  record info:
    record content source: DLC
    record creation date: 980713
    record change date: 20151021070208.0
    record identifier: in00001486743