Cover Image

Plasma processes for semiconductor fabrication /

Bibliographic Details
Main Author: Hitchon, W. Nicholas G.
Format: Book
Language:English
Published: Cambridge ; New York : Cambridge University Press, 1999.
Series:Cambridge studies in semiconductor physics and microelectronic engineering ; 8.
Subjects:
Semiconductors > Etching.
Plasma etching.
Description
Physical Description:ix, 221 pages : illustrations ; 26 cm.
Bibliography:Includes bibliographical references (pages 205-211) and index.
ISBN:0521591759 (hardback)