Yield learning with line width, sample size and bridge resistance variation /
be detected using electrical methods. Hence the use of
| Main Author: | |
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| Format: | Thesis eBook |
| Language: | English |
| Published: |
[Place of publication not identified] :
[publisher not identified] ;
1997.
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| Subjects: | |
| Online Access: | Link to OAKTrust copy |
| Summary: | be detected using electrical methods. Hence the use of costs are the fastest rising expense occurring in the defect-fault dictionary building and have observed the effect of various defect sample sizes on the resolution of effects of certain noise sources such as line width fabrication line are required in order to maximize the slope fabrication line. In addition, many of the defects can only increase. We have used an already available methodology of learning, and determined how to account for them. In this of the semiconductor manufacturing yield ramp. Metrology Pareto accuracy. Our observations and correction model allow predictions is profound and must be collected. We will show presence of these noise sources. random on a few wafer samples, its effect on defect Pareto Rapid failure analysis and continuous monitoring of the reduced by using relatively small sample sizes without a research we will show that since line width variation is not sensitivity of defect density to line width variation and shall also confirm this experimentally. We have examined the significant reduction in Pareto accuracy. We shall also show simulation-based models for defect diagnosis is on the that a distribution of bridge resistance does not effect the that a linear model is sufficient to correct for the the defect-fault dictionary and hence on the diagnosibility. us to make accurate defect Pareto predictions in the variation, sample size and bridge resistance on yield We will show that the dictionary construction costs can be |
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| Item Description: | "Major subject: Electrical Engineering". Vita. |
| Physical Description: | xviii, 107 leaves : illustrations ; 28 cm. Also available online. Issued also on microfiche from Lange Micrographics. |
| Bibliography: | Includes bibliographical references: pages 101-106. |