Cover Image

Optical microlithography XI : 25-27 February 1998, Santa Clara, California /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, SEMATECH (Organization)
Other Authors: Van den Hove, Luc
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [1998]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3334.
Subjects:
Microlithography > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Description
Physical Description:xv, 1090 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819427799